All Litel Instruments products integrate smoothly into semiconductor manufacturing fabs, and use standard semiconductor processing, ensuring rapid results without the need for special tool set up.

Litel products are fully portable and can be shared between multiple lithography tools, giving an extremely cost-effective metrology solution.

Litel's Products

InspecStep™ Interferometer (ISI™)

ISI™ comprises an interferometer and a software package for analyzing data received from an overlay tool. The interferometer is used to expose on a standard wafer a pattern in which aberration effects are amplified. This pattern is exposed as an array of outer box-in-box overlay targets. The inner half of the box-in-box target is unaberrated. The resultant overlay measurements form the basis of the aberration calculation. Many other optical parameters are also calculated.

Source Metrology Instrument (SMI™)

The SMI™ product comprises an optical component in the same form factor as a standard reticle, and a software package for analyzing the data received from an image capture tool. The optical component is used to expose images of the pupil plane on a standard wafer. These images are made through exposure, and are then collected on a frame – grabbing image capture station. The images are then passed to the software for reconstruction of the intensity profile and the calculation of many illuminator system parameters.

LumeNA and TMAP™ - measure lens NA and transmission at the exit pupil of the main lens.

DMAP™ - measures image distortion and separates lens and stage components

ACE™ Analysis Characterization Engine
ACE performs both metrology calculations and machine emulation – where the term machine emulation is technically defined as the ability to mimic the lithographic behavior of a scanner (and
process) using high accuracy scanner metrology and a powerful lithographic engine.